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Innovative technologies, devices and materials

Presentation

Programme (detailed contents):

 

Cold plasma assisted processes -Electric discharge in gas-

Continuous discharge-RF discharge- reaction mechanism in plasma- PECVD- dry etching

 

SiC, Si-Ge-C alloys: structure, electronic properties, applications, component integration

SOI: production, applications

Si nanocrystals: memory and opto-electronic

 

Working process of a OLED - EPR principle - Single photon nano-emitter-Diffusion process: cross-section's notion in embedded component.

 

Theory of electronic, electrostatic and optical near fields

Scanning probe microscopies : STM, AFM, SNOM

Principle, architecture, modes of imaging and spectroscopy

 

 

Organisation:

Plasma:

2 lectures of 1h15 per week

Lectures with a powerpoint support 

 

 

New technologies and materials for the microelectronics applications:

1 lecture of 1h15 per week

Duplicated notes given to the students

 

Light-matter interaction:

1 labwork session of 3h per week

 

 

Scanning probe microscopies:

2 lectures of 1h15 per week

Lectures with a powerpoint support 

Duplicated notes given to the students

1 practical session of 7 h

 

Main difficulties for students:

  Limited knowledge of solid-state thermodynamics, metallurgy, matrix formalism of the quantum mechanics

Objectives

 At the end of this module, the student will have understood and be able to explain:

 

- The plasma process

- New technologies and materials for the microelectronics applications

- Concepts of the physics of continuous media

- Quantum phenomena such as diffusion, EPR, , quantum cryptography: entangled states, single-photon and pairs of  entangled states source based on semiconductors quantum dots

 

 

The student will be able to apply the quantum mechanics formalism to describe innovative devices at the nano-scale. 

 

 

The student will be able to:

 

-choose the kind of scanning probe microscopy well adapted to one a specific application

-analyse and interpret basic images of scanning probe microscopy

 

Needed prerequisite

Electromagnetism

Quantum Mechanics (I4GPPM11)

Mathematics: matrix calculus and differential equations

Physical Metallurgy (real crystal, diffusion, precipitation, nucleation and growth)

Basic knowledge of symbolic computational tool like Maxima

Form of assessment

The evaluation of outcome prior learning is made as a continuous training during the semester. According ot the teaching, the assessment will be different: as a written exam, an oral exam, a record, a written report, peers review...